Method and apparatus for controlling chemical interactions during planarization of microelectronic substrates
A Standard patent application filed on 26 April 2001 credited to Meikle, Scott G ; Chopra, Dinesh

Details

Application number :
2001259238  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Method and apparatus for controlling chemical interactions during planarization of microelectronic substrates  
Inventor :
Meikle, Scott G ; Chopra, Dinesh  
Agent name :
 
Address for service :
 
Filing date :
26 April 2001  
Associated companies :
 
Applicant name :
Micron Technology, Inc.  
Applicant address :
 
Old name :
 
Original Source :
Go  

Same Inventor