Photoresist remover composition
A Standard patent application filed on 14 August 2000 credited to Baik, Ji-Hum ; Yoo, Chong-Soon ; Lee, Sang-Dai ; Oh, Chang-Il

Details

Application number :
65993  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Photoresist remover composition  
Inventor :
Baik, Ji-Hum ; Yoo, Chong-Soon ; Lee, Sang-Dai ; Oh, Chang-Il  
Agent name :
 
Address for service :
 
Filing date :
14 August 2000  
Associated companies :
 
Applicant name :
Dongjin Semichem Co., Ltd.  
Applicant address :
 
Old name :
 
Original Source :
Go  

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