Acidic composition containing fluoride for removal of photoresists and etch residues
A Standard patent application filed on 04 January 2000 credited to Ward, Irl E. ; Peters, Daryl W.

Details

Application number :

25989  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Acidic composition containing fluoride for removal of photoresists and etch residues  

Inventor :

Ward, Irl E. ; Peters, Daryl W.  

Agent name :

 

Address for service :

 

Filing date :

04 January 2000  

Associated companies :

 

Applicant name :

Ashland Inc.  

Applicant address :

 

Old name :

 

Original Source :

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