Compositions and method for removing photoresist and/or resist residue
A Standard patent application filed on 17 July 2003 credited to Seghal, Akshey

Details

Application number :

2003253961  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Compositions and method for removing photoresist and/or resist residue  

Inventor :

Seghal, Akshey  

Agent name :

 

Address for service :

 

Filing date :

17 July 2003  

Associated companies :

 

Applicant name :

SCP GLOBAL TECHNOLOGIES, INC.  

Applicant address :

400 Benjamin Lane, Boise, ID 83704  

Old name :

 

Original Source :

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