Chemical vapor deposition method
A Standard patent application filed on 30 December 1986 credited to Ohtoshi, Hirokazu ; Shimizu, Isamu ; Hanna, Junichi

Details

Application number :

67063  

Application type :

Standard  

Application status :

EXPIRED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Chemical vapor deposition method  

Inventor :

Ohtoshi, Hirokazu ; Shimizu, Isamu ; Hanna, Junichi  

Agent name :

SPRUSON & FERGUSON  

Address for service :

GPO Box 3898 SYDNEY NSW 2001  

Filing date :

30 December 1986  

Associated companies :

 

Applicant name :

Canon Kabushiki Kaisha  

Applicant address :

30-2, 3-Chome, Shimomaruko, Ohta-Ku, Tokyo, Japan  

Old name :

 

Original Source :

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