Improved chemical vapor deposition method of producing fluorine-doped tin oxide coatings
A Standard patent application filed on 24 December 1985 credited to Lindner, Georg H.
Details
Application number :
51666
Application type :
Standard
Application status :
CEASED
Under opposition :
No
Proceeding type :
Invention title :
Improved chemical vapor deposition method of producing fluorine-doped tin oxide coatings
Inventor :
Lindner, Georg H.
Agent name :
WATERMARK PATENT AND TRADE MARKS ATTORNEYS
Address for service :
Level 2 302 Burwood Road HAWTHORN VIC 3122
Filing date :
24 December 1985
Associated companies :
Applicant name :
ATOFINA Chemicals, Inc.
Applicant address :
2000 Market Street Philadelphia Pennsylvania 19103-3222 United States Of America