Toggle navigation
PATENT LOOKUP
Home
About
Search Tips
Search
Method for forming a deposited film
A Standard patent application filed on 22 October 1986 credited to Ishihara, Shunichi ; Shimizu, Isamu ; Hanna, Junichi
Details
Application number :
64270
Application type :
Standard
Application status :
EXPIRED
Under opposition :
No
Proceeding type :
Invention title :
Method for forming a deposited film
Inventor :
Ishihara, Shunichi ; Shimizu, Isamu ; Hanna, Junichi
Agent name :
SPRUSON & FERGUSON
Address for service :
GPO Box 3898 SYDNEY NSW 2001
Filing date :
22 October 1986
Associated companies :
Applicant name :
Canon Kabushiki Kaisha
Applicant address :
30-2, 3-Chome, Shimomaruko, Ohta-Ku, Tokyo, Japan
Old name :
Original Source :
Go
Related Patents
Method for forming a deposited film
Apparatus and method for forming a deposited film by means of...
Source reagent compositions and method for forming metal films on a...
Same Inventor
Method for forming deposited film
Method for preparation of multi-layer structure film
Method for forming deposited film
Process for the preparation of image-reading photosensor
Electrophotographic photosensitive member, process and apparatus...
PATENT LOOKUP
Home
Browse
About
Search Tips