Apparatus and method for forming a deposited film by means of plasma CVD
A Standard patent application filed on 31 January 2001 credited to Yajima, Takahiro ; Shishido, Takeshi ; Koda, Yuzo ; Kanai, Masahiro

Details

Application number :

16740  

Application type :

Standard  

Application status :

SEALED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Apparatus and method for forming a deposited film by means of plasma CVD  

Inventor :

Yajima, Takahiro ; Shishido, Takeshi ; Koda, Yuzo ; Kanai, Masahiro  

Agent name :

SPRUSON & FERGUSON  

Address for service :

GPO Box 3898 SYDNEY NSW 2001  

Filing date :

31 January 2001  

Associated companies :

 

Applicant name :

Canon Kabushiki Kaisha  

Applicant address :

3-30-2 Shimomaruko Ohta-ku Tokyo 146 Japan  

Old name :

 

Original Source :

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Same Inventor

• Apparatus and method for forming deposited film