Compositions for cleaning organic and plasma etched residues for semiconductor devices
A Standard patent application filed on 02 May 2000 credited to Small, Robert J.
;
Maw, Tai-Shih
;
Cheng, Jun
Details
Application number :
49803
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Compositions for cleaning organic and plasma etched residues for semiconductor devices