Streamlined ic mask layout optical and process correction through correction reuse
A Standard patent application filed on 03 March 2000 credited to Cobb, Nicolas Bailey
Details
Application number :
37222
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Streamlined ic mask layout optical and process correction through correction reuse
Inventor :
Cobb, Nicolas Bailey
Agent name :
Davies Collison Cave
Address for service :
Level 15 1 Nicholson Street MELBOURNE VIC 3000
Filing date :
03 March 2000
Associated companies :
Applicant name :
Mentor Graphics Corporation
Applicant address :
8005 S.W.Boeckman Road Wilsonville OR 97070 United States Of America