Details

Application number :
2003297347  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Photoresist removal  
Inventor :
Bernhard, David D. ; Baum, Thomas H. ; Murphy, Melissa K. ; Minsek, David W.  
Agent name :
 
Address for service :
 
Filing date :
17 December 2003  
Associated companies :
 
Applicant name :
ADVANCED TECHNOLOGY MATERIALS, INC.  
Applicant address :
Ryann, William, F., 7 Commerce Drive, Danbury, CT 06810  
Old name :
 
Original Source :
Go  

Related Patents