Method for removing photoresist and etch residues
A Standard patent application filed on 17 January 2003 credited to Nishimura, Eiichi ; Balasubramaniam, Vaidyanathan ; Hagiwara, Masaaki ; Inazawa, Kouichiro

Details

Application number :
2003262408  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Method for removing photoresist and etch residues  
Inventor :
Nishimura, Eiichi ; Balasubramaniam, Vaidyanathan ; Hagiwara, Masaaki ; Inazawa, Kouichiro  
Agent name :
 
Address for service :
 
Filing date :
17 January 2003  
Associated companies :
 
Applicant name :
TOKYO ELECTRON LIMITED  
Applicant address :
TBS Broadcast Center, 3-6, Akasaka 5-chome, Minato-ku, Tokyo 107-8481  
Old name :
 
Original Source :
Go  

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