Method for depositing nitride film using chemical vapor deposition apparatus of single chamber type

Application number :: 2003263633
Application type :: Standard
Application status :: LAPSED
Under opposition :: No
Proceeding type :
Invention title :: Method for depositing nitride film using chemical vapor deposition apparatus of single chamber type
Inventor :: Um, Pyung-Yong
Agent name :
Address for service :
Filing date :: 19 September 2003
Associated companies :
Applicant name :: EUGENE TECHNOLOGY CO., LTD.
Applicant address :: 4-3, Chaam-Dong, 330-200 Cheonan, Chungcheongnam-Do
Old name :
Original Source :: Go

Method for depositing nitride film using chemical vapor deposition apparatus of single chamber type A Standard patent application filed on 19 September 2003 credited to Um, Pyung-Yong