Plasma processing method and plasma processing device
A Standard patent application filed on 28 August 2003 credited to Higuchi, Kimihiro ; Shindo, Toshihiko ; Okamoto, Shin

Details

Application number :
2003261790  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Plasma processing method and plasma processing device  
Inventor :
Higuchi, Kimihiro ; Shindo, Toshihiko ; Okamoto, Shin  
Agent name :
 
Address for service :
 
Filing date :
28 August 2003  
Associated companies :
 
Applicant name :
TOKYO ELECTRON LIMITED  
Applicant address :
3-6, Akasaka 5-chome, Minato-ku, Tokyo 107-8481  
Old name :
 
Original Source :
Go  

Related Patents