Method of processing quartz member for plasma processing device, quartz member for plasma processing device, and plasma processing device having quartz member for plasma processing device mounted thereon
A Standard patent application filed on 12 September 2002 credited to Saegusa, Hidehito ; Nakayama, Hiroyuki ; Imafuku, Kosuke ; Mitsuhashi, Kouji ; Huang, Yahui ; Okayama, Nobuyuki ; Sugiyama, Norikazu ; Iimuro, Shinichi ; Nagayama, Nobuyuki

Details

Application number :

2002332170  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method of processing quartz member for plasma processing device, quartz member for plasma processing device, and plasma processing device having quartz member for plasma processing device mounted thereon  

Inventor :

Saegusa, Hidehito ; Nakayama, Hiroyuki ; Imafuku, Kosuke ; Mitsuhashi, Kouji ; Huang, Yahui ; Okayama, Nobuyuki ; Sugiyama, Norikazu ; Iimuro, Shinichi ; Nagayama, Nobuyuki  

Agent name :

 

Address for service :

 

Filing date :

12 September 2002  

Associated companies :

 

Applicant name :

TOKYO ELECTRON LIMITED  

Applicant address :

3-6, Akasaka 5-chome, Minato-ku, Tokyo 107-8481  

Old name :

 

Original Source :

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