Method of forming a thin film using atomic layer deposition(ald)
A Standard patent application filed on 16 January 2003 credited to Park, Young-Hoon ; Bae, Jang-Ho

Details

Application number :
2003238061  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Method of forming a thin film using atomic layer deposition(ald)  
Inventor :
Park, Young-Hoon ; Bae, Jang-Ho  
Agent name :
 
Address for service :
 
Filing date :
16 January 2003  
Associated companies :
 
Applicant name :
IPS LTD.  
Applicant address :
33, Jije-dong, Pyungtaek-city, Kyungki-do 450-090  
Old name :
 
Original Source :
Go  

Same Inventor