Reactor for thin film deposition and method for depositing thin film on wafer using the reactor
A Standard patent application filed on 16 July 2002 credited to Lim, Hong-Joo ; Kyung, Hyun-Soo ; Lee, Ik-Haeng ; Park, Young-Hoon ; Yoo, Keun-Jae ; Lee, Sang-Jin ; Lee, Sang-Kyu ; Bae, Jang-Ho

Details

Application number :

2002319934  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Reactor for thin film deposition and method for depositing thin film on wafer using the reactor  

Inventor :

Lim, Hong-Joo ; Kyung, Hyun-Soo ; Lee, Ik-Haeng ; Park, Young-Hoon ; Yoo, Keun-Jae ; Lee, Sang-Jin ; Lee, Sang-Kyu ; Bae, Jang-Ho  

Agent name :

 

Address for service :

 

Filing date :

16 July 2002  

Associated companies :

 

Applicant name :

IPS LTD.  

Applicant address :

33, Jije-dong, Pyungtaek-city, 450-090 Kyungki-do  

Old name :

 

Original Source :

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