Chemical vapor deposition reactor

Application number :: 2002353021
Application type :: Standard
Application status :: LAPSED
Under opposition :: No
Proceeding type :
Invention title :: Chemical vapor deposition reactor
Inventor :: Petrone, Benjamin J. ; Grant, Robert W. ; Mumbauer, Paul D. ; Brubaker, Matthew D.
Agent name :
Address for service :
Filing date :: 04 December 2002
Associated companies :
Applicant name :: PRIMAXX, INC.
Applicant address :: 7377 William Avenue, #800, Allentown, PA 18106
Old name :
Original Source :: Go

Chemical vapor deposition reactor A Standard patent application filed on 04 December 2002 credited to Petrone, Benjamin J. ; Grant, Robert W. ; Mumbauer, Paul D. ; Brubaker, Matthew D.