Susceptorless reactor for growing epitaxial layers on wafers by chemical vapor deposition
A Standard patent application filed on 21 August 2001 credited to Boguslavskiy, Vadim ; Gurary, Alexander

Details

Application number :
2001285127  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Susceptorless reactor for growing epitaxial layers on wafers by chemical vapor deposition  
Inventor :
Boguslavskiy, Vadim ; Gurary, Alexander  
Agent name :
 
Address for service :
 
Filing date :
21 August 2001  
Associated companies :
 
Applicant name :
EMCORE CORPORATION  
Applicant address :
145 Belmont Drive, Somerset, NJ 08873-1214  
Old name :
 
Original Source :
Go  

Same Inventor