Polishing fluid and polishing method
A Standard patent application filed on 31 October 2002 credited to Amanokura, Jin
;
Fukasawa, Masato
;
Sakurada, Takafumi
;
Anzai, Sou
;
Sasaki, Shouichi
Details
Application number :
2002343807
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Polishing fluid and polishing method
Inventor :
Amanokura, Jin
;
Fukasawa, Masato
;
Sakurada, Takafumi
;
Anzai, Sou
;
Sasaki, Shouichi
Agent name :
Address for service :
Filing date :
31 October 2002
Associated companies :
Applicant name :
HITACHI CHEMICAL CO., LTD.
Applicant address :
1-1, Nishishinjuku 2-chome, Shinjuku-ku, Tokyo 163-0449