Projection optical system and exposure device having the projection optical system
A Standard patent application filed on 05 June 2002 credited to Takahashi, Tomowaki
Details
Application number :
2002313171
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Projection optical system and exposure device having the projection optical system
Inventor :
Takahashi, Tomowaki
Agent name :
Address for service :
Filing date :
05 June 2002
Associated companies :
Applicant name :
NIKON CORPORATION
Applicant address :
2-3, Marunouchi 3-chome, Chiyoda-ku, Tokyo 100-8331