Active reticle, method for making same, ion projecting lithography method using same and equipment therefor
A Standard patent application filed on 24 April 2001 credited to Le Roux, Vincent ; Lazzari, Jean-Pierre

Details

Application number :

48457  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Active reticle, method for making same, ion projecting lithography method using same and equipment therefor  

Inventor :

Le Roux, Vincent ; Lazzari, Jean-Pierre  

Agent name :

 

Address for service :

 

Filing date :

24 April 2001  

Associated companies :

 

Applicant name :

X-Ion  

Applicant address :

 

Old name :

 

Original Source :

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Same Inventor

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