Process of tungsten chemical vapor deposition onto titanium nitride substrate
A Standard patent application filed on 26 January 1998 credited to Webb, Douglas A.

Details

Application number :
63172  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Process of tungsten chemical vapor deposition onto titanium nitride substrate  
Inventor :
Webb, Douglas A.  
Agent name :
 
Address for service :
 
Filing date :
26 January 1998  
Associated companies :
 
Applicant name :
Tokyo Electron Arizona, Inc.  
Applicant address :
 
Old name :
 
Original Source :
Go  

Same Inventor