Variable high temperature chuck for high density plasma chemical vapor deposition
A Standard patent application filed on 30 September 1997 credited to Mcmillin, Brian ; Nguyen, Huong ; Berney, Butch ; Barnes, Michael

Details

Application number :

45072  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Variable high temperature chuck for high density plasma chemical vapor deposition  

Inventor :

Mcmillin, Brian ; Nguyen, Huong ; Berney, Butch ; Barnes, Michael  

Agent name :

 

Address for service :

 

Filing date :

30 September 1997  

Associated companies :

 

Applicant name :

Lam Research Corporation  

Applicant address :

 

Old name :

 

Original Source :

Go  

Same Inventor

• Apparatus and method for high density plasma chemical vapor deposition