High flown vacuum chamber including equipment modules such as plasma generating source, vacuum pumping arrangement and/or cantilevered substrate support
A Standard patent application filed on 02 June 1997 credited to Benjamin, Neil
;
Mangano, Stefano
;
Hylbert, Jon
Details
Application number :
32164
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
High flown vacuum chamber including equipment modules such as plasma generating source, vacuum pumping arrangement and/or cantilevered substrate support