Sputter etching apparatus with plasma source having a dielec tric pocket and contoured plasma source
A Standard patent application filed on 09 November 1995 credited to Ghanbari, Ebrahim

Details

Application number :

43637  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Sputter etching apparatus with plasma source having a dielec tric pocket and contoured plasma source  

Inventor :

Ghanbari, Ebrahim  

Agent name :

 

Address for service :

 

Filing date :

09 November 1995  

Associated companies :

 

Applicant name :

Materials Research Corporation  

Applicant address :

 

Old name :

 

Original Source :

Go  

Same Inventor

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