Details

Application number :
43637  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Sputter etching apparatus with plasma source having a dielec tric pocket and contoured plasma source  
Inventor :
Ghanbari, Ebrahim  
Agent name :
 
Address for service :
 
Filing date :
09 November 1995  
Associated companies :
 
Applicant name :
Materials Research Corporation  
Applicant address :
 
Old name :
 
Original Source :
Go  

Same Inventor