System and method for simultaneously measuring thin film layer thickness, reflectivity, roughness, surface profile and magnetic pattern on thin film magnetic disks and silicon wafers
A Standard patent application filed on 06 October 2000 credited to Kudinar, Rusmin
;
Meeks, Steven W.
Details
Application number :
79963
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
System and method for simultaneously measuring thin film layer thickness, reflectivity, roughness, surface profile and magnetic pattern on thin film magnetic disks and silicon wafers