Susceptorless semiconductor wafer support and reactor system for epitaxial layergrowth
A Standard patent application filed on 04 May 2000 credited to Hartmann, Dominic A.
;
Dietze, Gerald R.
Details
Application number :
48232
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Susceptorless semiconductor wafer support and reactor system for epitaxial layergrowth