An apparatus for integrated monitoring of wafers and for process control in the semiconductor manufacturing and method for use thereof
A Standard patent application filed on 07 November 1999 credited to Finarov, Moshe
Details
Application number :
10727
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
An apparatus for integrated monitoring of wafers and for process control in the semiconductor manufacturing and method for use thereof