Device and method for the optical measurement of an optical system, a container therefor, and a microlithography projection exposure machine
A Standard patent application filed on 19 December 2003 credited to Stuhler, Joachim ; Schellhorn, Uwe ; Wegmann, Ulrich

Details

Application number :

2003298221  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Device and method for the optical measurement of an optical system, a container therefor, and a microlithography projection exposure machine  

Inventor :

Stuhler, Joachim ; Schellhorn, Uwe ; Wegmann, Ulrich  

Agent name :

 

Address for service :

 

Filing date :

19 December 2003  

Associated companies :

 

Applicant name :

CARL ZEISS SMT AG  

Applicant address :

Carl-Zeiss-Strasse 22, 73447 Oberkochen  

Old name :

 

Original Source :

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