Plasma processing system and method and electrode plate of plasma processing system
A Standard patent application filed on 25 November 2003 credited to Koshiishi, Akira ; Sasaki, Hiromitsu ; Ishihara, Hiroyuki ; Hirose, Jun ; Yoshida, Tetsuo ; Numata, Kohji ; Ogasawara, Masahiro ; Saito, Michishige ; Hirano, Taichi ; Ooyabu, Jun

Details

Application number :
2003284682  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Plasma processing system and method and electrode plate of plasma processing system  
Inventor :
Koshiishi, Akira ; Sasaki, Hiromitsu ; Ishihara, Hiroyuki ; Hirose, Jun ; Yoshida, Tetsuo ; Numata, Kohji ; Ogasawara, Masahiro ; Saito, Michishige ; Hirano, Taichi ; Ooyabu, Jun  
Agent name :
 
Address for service :
 
Filing date :
25 November 2003  
Associated companies :
 
Applicant name :
TOKYO ELECTRON LIMITED  
Applicant address :
3-6, Akasaka 5-chome, Minato-ku, Tokyo 107-8481  
Old name :
 
Original Source :
Go  

Same Inventor