Improved deposition shield in a plasma processing system,and methods of manufacture of such shield
A Standard patent application filed on 29 September 2003 credited to Saigusa, Hidehito ; Takase, Taira ; Mitsuhashi, Kouji ; Nakayama, Hiroyuki

Details

Application number :
2003272031  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Improved deposition shield in a plasma processing system,and methods of manufacture of such shield  
Inventor :
Saigusa, Hidehito ; Takase, Taira ; Mitsuhashi, Kouji ; Nakayama, Hiroyuki  
Agent name :
 
Address for service :
 
Filing date :
29 September 2003  
Associated companies :
 
Applicant name :
TOKYO ELECTRON LIMITED  
Applicant address :
TBS Broadcast Center, 3-6, Akasaka 5-chome, Minato-ku, Tokyo 107-8481  
Old name :
 
Original Source :
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