Optical window deposition shield in a plasma processing system
A Standard patent application filed on 29 September 2003 credited to Saigusa, Hidehito ; Nakayama, Hiroyuki ; Takase, Taira ; Nishimoto, Shinya ; Mitsuhashi, Kouji

Details

Application number :

2003274589  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Optical window deposition shield in a plasma processing system  

Inventor :

Saigusa, Hidehito ; Nakayama, Hiroyuki ; Takase, Taira ; Nishimoto, Shinya ; Mitsuhashi, Kouji  

Agent name :

 

Address for service :

 

Filing date :

29 September 2003  

Associated companies :

 

Applicant name :

TOKYO ELECTRON LIMITED  

Applicant address :

TBS Broadcast Center, 3-6 Akasaka 5-chome, Minato-ku, Tokyo 107-8481  

Old name :

 

Original Source :

Go