Atomic layer deposition of high k metal oxides
A Standard patent application filed on 18 August 2003 credited to Lee, Sang-In ; Senzaki, Yoshihide ; Lee, Sang-Kyoo

Details

Application number :

2003263872  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Atomic layer deposition of high k metal oxides  

Inventor :

Lee, Sang-In ; Senzaki, Yoshihide ; Lee, Sang-Kyoo  

Agent name :

 

Address for service :

 

Filing date :

18 August 2003  

Associated companies :

 

Applicant name :

ASML US, INC.  

Applicant address :

440 Kings Village Road, Scotts Valley, CA 95066  

Old name :

 

Original Source :

Go  

Same Inventor

• Atomic layer deposition of high k metal silicates
• Low termperature deposition of silicon oxides and oxynitrides