Atomic layer deposition of high k metal silicates
A Standard patent application filed on 18 August 2003 credited to Lee, Sang-In ; Senzaki, Yoshihide ; Lee, Sang-Kyoo

Details

Application number :

2003259879  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Atomic layer deposition of high k metal silicates  

Inventor :

Lee, Sang-In ; Senzaki, Yoshihide ; Lee, Sang-Kyoo  

Agent name :

 

Address for service :

 

Filing date :

18 August 2003  

Associated companies :

 

Applicant name :

ASML US, INC.  

Applicant address :

440 Kings Village Road, Scotts Valley, CA 95066  

Old name :

 

Original Source :

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Same Inventor

• Low termperature deposition of silicon oxides and oxynitrides
• Atomic layer deposition of high k metal oxides