High density recording medium with super-resolution near-field structure manufactured using high-melting point metal oxide or silicon oxide mask layer
A Standard patent application filed on 24 September 2003 credited to Tominaga, Junji ; Kim, Joo-Ho

Details

Application number :
2003263652  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
High density recording medium with super-resolution near-field structure manufactured using high-melting point metal oxide or silicon oxide mask layer  
Inventor :
Tominaga, Junji ; Kim, Joo-Ho  
Agent name :
 
Address for service :
 
Filing date :
24 September 2003  
Associated companies :
 
Applicant name :
SAMSUNG ELECTRONICS CO., LTD.  
Applicant address :
416, Maetan-dong, Yeongtong-gu, Suwon-si, Gyeonggi-do 442-742  
Old name :
 
Original Source :
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Same Inventor