Method for removing photoresist and plasma etch residues
A Standard patent application filed on 06 April 1998 credited to Leon, Vincent G. ; Rothgery, Eugene F. ; Honda, Kenji

Details

Application number :

69556  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method for removing photoresist and plasma etch residues  

Inventor :

Leon, Vincent G. ; Rothgery, Eugene F. ; Honda, Kenji  

Agent name :

 

Address for service :

 

Filing date :

06 April 1998  

Associated companies :

 

Applicant name :

Olin Microelectronic Chemicals, Inc.  

Applicant address :

 

Old name :

 

Original Source :

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