Photoresists, fluoropolymers and processes for 157 nm microlithography
A Standard patent application filed on 08 August 2003 credited to Feiring, Andrew E. ; Smart, Bruce Edmund ; Farnham, William Brown ; Petrov, Viacheslav Alexandrovich ; Schadt, Frank L. Iii

Details

Application number :

2003259729  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Photoresists, fluoropolymers and processes for 157 nm microlithography  

Inventor :

Feiring, Andrew E. ; Smart, Bruce Edmund ; Farnham, William Brown ; Petrov, Viacheslav Alexandrovich ; Schadt, Frank L. Iii  

Agent name :

 

Address for service :

 

Filing date :

08 August 2003  

Associated companies :

 

Applicant name :

E. I. DU PONT DE NEMOURS AND COMPANY  

Applicant address :

1007 Market Street, Wilmington, DE 19898  

Old name :

 

Original Source :

Go  

Same Inventor

• Photoresists, fluorinated polymers and processes for 157 nm...
• Fluorinated monomers, fluorinated polymers having polycyclic groups...