Method and apparatus for shaping thin films in the near-edge regions of in-process semiconductor substrates
A Standard patent application filed on 24 April 2003 credited to Robbins, Michael D.
Details
Application number :
2003225127
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Method and apparatus for shaping thin films in the near-edge regions of in-process semiconductor substrates