Method and apparatus for generating and confining a reactive gas for etching substrates
A Standard patent application filed on 12 January 2000 credited to America, William G. ; Robbins, Michael D. ; Gratrix, Edward J.

Details

Application number :

25035  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method and apparatus for generating and confining a reactive gas for etching substrates  

Inventor :

America, William G. ; Robbins, Michael D. ; Gratrix, Edward J.  

Agent name :

 

Address for service :

 

Filing date :

12 January 2000  

Associated companies :

 

Applicant name :

Ipec Precision, Inc.  

Applicant address :

 

Old name :

 

Original Source :

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