A system and method for determining the state of a film in a plasma reactor using an electrical property
A Standard patent application filed on 28 March 2003 credited to Donohue, John

Details

Application number :

2003224727  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

A system and method for determining the state of a film in a plasma reactor using an electrical property  

Inventor :

Donohue, John  

Agent name :

 

Address for service :

 

Filing date :

28 March 2003  

Associated companies :

 

Applicant name :

TOKYO ELECTRON LIMITED  

Applicant address :

3-6, Akasaka 5-chome, Mianto-ku, Tokyo 107-8481  

Old name :

 

Original Source :

Go  

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