Method of fabricating probe for spm having fet channel structure utilizing self-aligned fabrication
A Standard patent application filed on 26 April 2003 credited to Park, Hong-Sik ; Jung, Ju-Hwan ; Shin, Hyun-Jung

Details

Application number :

2003222507  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method of fabricating probe for spm having fet channel structure utilizing self-aligned fabrication  

Inventor :

Park, Hong-Sik ; Jung, Ju-Hwan ; Shin, Hyun-Jung  

Agent name :

 

Address for service :

 

Filing date :

26 April 2003  

Associated companies :

 

Applicant name :

Samsung Electronics Co., Ltd/  

Applicant address :

416 Maetan-dong, Yeongtong-gu Suwon-si Gyeonggi-do 442-742 Republic of Korea  

Old name :

 

Original Source :

Go  

Same Inventor

• Semiconductor probe with resistive tip and method of fabricating...