Method of forming different silicide portions on different silicon-containing regions in a semiconductor device
A Standard patent application filed on 20 December 2002 credited to Wieczorek, Karsten ; Stephan, Rolf ; Horstmann, Manfred

Details

Application number :
2002360826  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Method of forming different silicide portions on different silicon-containing regions in a semiconductor device  
Inventor :
Wieczorek, Karsten ; Stephan, Rolf ; Horstmann, Manfred  
Agent name :
 
Address for service :
 
Filing date :
20 December 2002  
Associated companies :
 
Applicant name :
ADVANCED MICRO DEVICES, INC.  
Applicant address :
One AMD Place, Mail Stop 68, P.O. Box 3453, Sunnyvale, CA 94088-3453  
Old name :
 
Original Source :
Go  

Same Inventor