Details

Application number :
2002355030  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Plasma processing system  
Inventor :
Ito, Etsuji ; Hayami, Toshihiro ; Sakai, Itsuko  
Agent name :
 
Address for service :
 
Filing date :
26 November 2002  
Associated companies :
 
Applicant name :
KABUSHIKI KAISHA TOSHIBA  
Applicant address :
1-1, Shibaura 1-chome, Minato-ku, Tokyo 105-0014  
Old name :
 
Original Source :
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