Details
- Application number :
- 2002354093
- Application type :
- Standard
- Application status :
- LAPSED
- Under opposition :
- No
- Proceeding type :
-
- Invention title :
- Plasma processing device
- Inventor :
- Hayashi, Daisuke
;
Hayami, Toshihiro
;
Ono, Hiroo
- Agent name :
-
- Address for service :
-
- Filing date :
- 05 December 2002
- Associated companies :
-
- Applicant name :
- TOKYO ELECTRON LIMITED
- Applicant address :
- 3-6, Akasaka 5-chome, Minato-ku, Tokyo 107-8481
- Old name :
-
- Original Source :
- Go