Details

Application number :
2002330308  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Plasma processing device  
Inventor :
Hayashi, Daisuke ; Ono, Hiroo ; Honda, Masanobu ; Tateshita, Koichi ; Nagaseki, Kazuya  
Agent name :
 
Address for service :
 
Filing date :
19 September 2002  
Associated companies :
 
Applicant name :
TOKYO ELECTRON LIMITED  
Applicant address :
3-6, Akasaka 5-chome, Minato-ku, Tokyo 107-8481  
Old name :
 
Original Source :
Go  

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