Photosnesitive resin composition comprising quinonediazide sulfate ester compound
A Standard patent application filed on 21 October 2002 credited to Cho, Joon-Yeon ; Park, Soo-Jung ; Kwon, Kyong-Il

Details

Application number :
2002348581  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Photosnesitive resin composition comprising quinonediazide sulfate ester compound  
Inventor :
Cho, Joon-Yeon ; Park, Soo-Jung ; Kwon, Kyong-Il  
Agent name :
 
Address for service :
 
Filing date :
21 October 2002  
Associated companies :
 
Applicant name :
DONGJIN SEMICHEM CO., LTD.  
Applicant address :
Gajwa-dong 472-2, Seo-ku, Incheon-city 405-250  
Old name :
 
Original Source :
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