Photosensitive resin composition for photoresist
A Standard patent application filed on 20 August 2002 credited to Kim, Byung-Uk ; Yoo, Jae-Won ; Park, Soo-Jung ; Kwon, Kyong-Il ; Cho, Joon-Yeon

Details

Application number :

2002327115  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Photosensitive resin composition for photoresist  

Inventor :

Kim, Byung-Uk ; Yoo, Jae-Won ; Park, Soo-Jung ; Kwon, Kyong-Il ; Cho, Joon-Yeon  

Agent name :

 

Address for service :

 

Filing date :

20 August 2002  

Associated companies :

 

Applicant name :

DONGJIN SEMICHEM CO., LTD.  

Applicant address :

Gajwa-dong 472-2, Seo-ku, 404-250 Incheon-city  

Old name :

 

Original Source :

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