Very narrow band, two chamber, high rep rate gas discharge laser system
A Standard patent application filed on 28 August 2002 credited to Ershov, Alexander I.
;
Partlo, William N.
;
Knowles, David S.
;
Myers, David W.
;
Onkels, Eckehard D.
;
Besaucele, Herve A.
;
Fomenkov, Igor V.
;
Oicles, Jeffrey
;
Das, Plash P.
;
Ujazdowski, Richard C.
;
Sandstrom, Richard L.
Details
Application number :
2002332801
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Very narrow band, two chamber, high rep rate gas discharge laser system
Inventor :
Ershov, Alexander I.
;
Partlo, William N.
;
Knowles, David S.
;
Myers, David W.
;
Onkels, Eckehard D.
;
Besaucele, Herve A.
;
Fomenkov, Igor V.
;
Oicles, Jeffrey
;
Das, Plash P.
;
Ujazdowski, Richard C.
;
Sandstrom, Richard L.
Agent name :
Address for service :
Filing date :
28 August 2002
Associated companies :
Applicant name :
Cymer, Inc.
Applicant address :
Legal Department -M/S 4-2C
17075 Thornmint Court
San Diego, CA 92127-2413
United States of America