Very narrow band, two chamber, high rep rate gas discharge laser system
A Standard patent application filed on 25 September 2001 credited to Ershov, Alexander I. ; Brown, Daniel J. W. ; Myers, David W. ; Onkels, Eckehard D. ; Besaucele, Herve A. ; Fomenkov, Igor V ; Pan, Xiaojiang J. ; Ujazdowski, Richard C. ; Sandstrom, Richard L ; Ness, Richard M. ; Anderson, Stuart L.

Details

Application number :
2001296334  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Very narrow band, two chamber, high rep rate gas discharge laser system  
Inventor :
Ershov, Alexander I. ; Brown, Daniel J. W. ; Myers, David W. ; Onkels, Eckehard D. ; Besaucele, Herve A. ; Fomenkov, Igor V ; Pan, Xiaojiang J. ; Ujazdowski, Richard C. ; Sandstrom, Richard L ; Ness, Richard M. ; Anderson, Stuart L.  
Agent name :
 
Address for service :
 
Filing date :
25 September 2001  
Associated companies :
 
Applicant name :
Cymer, Inc.  
Applicant address :
 
Old name :
 
Original Source :
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